Products
Titanium Metals - High-Purity Titanium
High-purity titanium 4N5(purity: 99.995%) and 5N (purity:99.999%) are used as sputtering target material for thin-film formations of semiconductors including DRAMs. This titanium contributes towards improved semiconductor performance.
Uses
Titanium sputtering targets for semiconductors, LCD flat panels, etc.
Product Line
Purity up to 5N Form: ingot, billet
Specifications
| Example of Specifications (4N5) | [Ti : % min., others : ppm max.] |
| Ti | Fe | Ni | Cr | Mn | Al | Si | Sn | Cu | Na | K | O | C | |
|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
| Guaranteed | 99.995 | 15 | 10 | 5 | 5 | 5 | 5 | 5 | 5 | 0.05 | 0.05 | 500 | 50 |
| Typical | Balance | 5 | 3 | <1 | <1 | <1 | <1 | <1 | <1 | <0.05 | <0.05 | 250 | 20 |
• Gaseous contents are not counted as impurity.
• Specifications are to be met with specific requirements from individual customers.
Titanium Sales Dept.
TEL : +81-(0)467-87-7023 FAX : +81-(0)467-82-6661