We meet the rigorous demand for high purity and low oxygen content with our advanced technology.
We produce high-purity titanium from high-purity titanium sponge, which is produced through the unique Kroll Process, by using a dedicated EB furnace, to stably realize the purity level of 4N5 to 5N and low oxygen content.
We provide high-purity titanium products in the form of ingots or billets, which are microstructure-controlled by casting, to meet the requests from clients.
Purposes of use
Material for sputtering targets for forming semiconductor films for DRAM, etc.
[% for Ti and ppm for other items]
*We keep the contents of other metal and gas components low.